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| ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2 |
| Kang Niankan |
| Institutte of Electronics Academic Sinica Beijing 100080 |
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Abstract The electron optical column for variable rectangular-shaped beam lithography system DJ-2 is described, with emphasis on the analysis of optical configuration and shaping deflection compensation. In this column the variable spot shaping is performed with a minimum number of lenses by a more reasonable optical scheme. A high-sensitivity electrostatic shaping deflector with serial parallel-plates is employed for high-speed spot shaping. With the accurate linear and rotational approaches, the spot current density of over 0.4 A/cm2 is obtained, with a tungsten hairpin cathode, and the edge resolution is better than 0.2 μm within 2 X 2 mm field size.
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Received: 30 March 1991
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1992, Vol. 14 
