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MEASUREMENT OF COMPLEX PERMITTIVITY OF MIC SUBSTRATES FOR DEPOSITION OF HTS THIN FILMS |
Tang Zongxi; Zhang Qishao |
University of Electronic Science and Technology of China,Chengdu 610054 |
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Abstract A technique is analysed for the determination of complex permittivity of MIC substrates for deposition of high- superconducting (HTS) thin films. By using high Q factor TM circular cavity, several monocrystals which are often used for deposition of HTS thin films are measured. The results show that the technique covers accurate measurements of the low-loww monocrystal and isotropy dielectric materials at different temperature, and the test is simple, rapid and automatic, and some directional complex permittivity of the dielectric materials can be measured.
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Received: 06 August 1994
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