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FRACTAL INTERPOLATION MODEL OF IC DEFECT OUTLINES |
Jiang Xiaohong;Zhao Tianxu;Hao Yue;Xu Guohua |
Microelectronics Institute,Xidian University,Xi’an 710071 |
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Abstract Available defect outline model used for yield prediction and inductive fault analysis of integrated circuits (IC) all model a real defect by replacing its real rugged outlines with circular discs or squares,then great errors were aroused in these models.Based on the idea of fractal interpolation,this paper presents a new model to characterize those real defect outlines.The comparison of the new model with those models available indicates that the new model is a more accurate defect outline model.
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Received: 18 November 1997
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