INFLUENCE OF NITROGEN FLOW RATE ON FIELD ELECTRON EMISSON ON AMORPHOUS-CARBON
Wang Xiaoping①; Li Yunjun①; Yao Ning①; Ma Huizhong②; Bi Zhaoqi①; Zhang Binglin①
①Dept. of Phys., Henan Fundam. and Appl. Sci. Res. Inst.,Zhengzhou Univ.,Zhengzhou 450052;②Dept. of Math and Phys.,Zhengzhou Industrial Univ., Zhengzhou 450002 China
Abstract：Using microwave plasma-assisted chemical vapor deposition system, the nitrogen dopeed amorphaus-carbon films are obtained on the deposited molybdenum films, which are deposited on ceramic (Al2O3). The scanning electron microscopy (SEM), optical microscopy, X-ray diffraction (XRD) and Raman spectrum are used to analyze the obtained. Experimental results show that, when increasing the nitrogen, the eaission current density increases and the turn-on field decreases.
王小平; 李运钧; 姚宁; 马会中; 毕兆琪; 张兵临. 氮流量对非晶碳膜场致电子发射的影响[J]. 电子与信息学报, 2001, 23(6): 622-624 .
Wang Xiaoping①; Li Yunjun①; Yao Ning①; Ma Huizhong②; Bi Zhaoqi①; Zhang Binglin①. INFLUENCE OF NITROGEN FLOW RATE ON FIELD ELECTRON EMISSON ON AMORPHOUS-CARBON. , 2001, 23(6): 622-624 .
2001, Vol. 23 
